PATTERN TRANSFER OF ELECTRON-BEAM MODIFIED SELF-ASSEMBLED MONOLAYERS FOR HIGH-RESOLUTION LITHOGRAPHY

Authors
LERCEL MJ ROOKS M TIBERIO RC CRAIGHEAD HG SHEEN CW PARIKH AN ALLARA DL
Citation
Mj. Lercel et al., PATTERN TRANSFER OF ELECTRON-BEAM MODIFIED SELF-ASSEMBLED MONOLAYERS FOR HIGH-RESOLUTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(3), 1995, pp. 1139-1143
Citations number
27
Journal title
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena → ACNP
ISSN journal
10711023
Volume
13
Issue
3
Year of publication
1995
Pages
1139 - 1143
Database
ISI
SICI code
1071-1023(1995)13:3<1139:PTOEMS>2.0.ZU;2-R