E-BEAM LITHOGRAPHY BY USING AN STEM WITH INTEGRATED LASER INTERFEROMETER STAGE

Authors
HUBNER B JEDE R SPECHT I ZENGERLE R
Citation
B. Hubner et al., E-BEAM LITHOGRAPHY BY USING AN STEM WITH INTEGRATED LASER INTERFEROMETER STAGE, Microelectronic engineering, 30(1-4), 1996, pp. 41-44
Citations number
6
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
41 - 44
Database
ISI
SICI code
0167-9317(1996)30:1-4<41:ELBUAS>2.0.ZU;2-K
Abstract
A high resolution e-beam lithography instrument has been developed con sisting of an STEM (Zeiss EM 910) equipped with a laser interferometer stage, an electrostatic beam blanker, and ''ELPHY Plus''. This new sy stem now allows to perform high voltage e-beam lithography on small sa mples with highest resolution and precise stitching.