THE ASSESSMENT OF NONUNIFORM PUPILS IN PHOTOLITHOGRAPHY

Authors
CAMPOS J ESCALER JC HILD R MUSCHALL R NITZSCHE G YZUEL MJ
Citation
J. Campos et al., THE ASSESSMENT OF NONUNIFORM PUPILS IN PHOTOLITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 103-106
Citations number
15
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
103 - 106
Database
ISI
SICI code
0167-9317(1996)30:1-4<103:TAONPI>2.0.ZU;2-R
Abstract
Axial and/or radial apodizing as well as hyperresolving filters are fi lters which may be used to produce small isolated and WS-structures in photolithography. For the assessment of the different filters a conse quent extension from the 3D-PSF to the 3D-line responses and the 3D-MT F is made. Additionally the OTF and the ATF for partially coherent ill umination are regarded. As an example the application of all of these functions to an axial apodizer is presented.