MICROLENS LITHOGRAPHY - A NEW APPROACH FOR LARGE DISPLAY FABRICATION

Citation
R. Volkel et al., MICROLENS LITHOGRAPHY - A NEW APPROACH FOR LARGE DISPLAY FABRICATION, Microelectronic engineering, 30(1-4), 1996, pp. 107-110
Citations number
12
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
107 - 110
Database
ISI
SICI code
0167-9317(1996)30:1-4<107:ML-ANA>2.0.ZU;2-D
Abstract
Microlens lithography is a new lithographic method, that uses microlen s arrays to image a lithographic mask onto a substrate layer. Microlen s lithography provides photolithography at a moderate resolution for a n almost unlimited area. The imaging system consists of stacked microl ens arrays forming an array of micro-objectives. Each micro-objective images a small part of the mask pattern, the images overlap in the ima ge plane. Potential applications for microlens lithography are the fab rication of large area flat panel displays (FPD), color filters, and m icromechanics.