Z. Cui et Pd. Prewett, CHARACTERIZATION OF EMBEDDED PHASE-SHIFT MASKS BY REFLECTANCE-TRANSMITTANCE MEASUREMENT, Microelectronic engineering, 30(1-4), 1996, pp. 145-148
A simple and inexpensive method has been applied to the determination
of transmission and phase shifting of fully embedded phase shift masks
. The method is based on the measurement of reflectance and transmitta
nce (R-T) of the embedded layer. A S-mirror reflection system has been
developed to carry out the R-T measurement and a computer program has
been written to calculate the real and imaginary components of refrac
tive index (n, k), and hence the phase shifting and attenuating proper
ties, of an embedded layer. The effectiveness and accuracy of the R-T
method has been confirmed by experiment.