PROXIMITY X-RAY-LITHOGRAPHY AS A QUICK REPLICATION TECHNIQUE IN NANOFABRICATION - RECENT PROGRESS AND PERSPECTIVES

Authors
CHEN Y ROUSSEAUX F HAGHIRIGOSNET AM KUPKA RK RAVET MF SIMON G LAUNOIS H
Citation
Y. Chen et al., PROXIMITY X-RAY-LITHOGRAPHY AS A QUICK REPLICATION TECHNIQUE IN NANOFABRICATION - RECENT PROGRESS AND PERSPECTIVES, Microelectronic engineering, 30(1-4), 1996, pp. 191-194
Citations number
14
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
191 - 194
Database
ISI
SICI code
0167-9317(1996)30:1-4<191:PXAAQR>2.0.ZU;2-#
Abstract
With synchrotron radiation (SuperACO) and a commercial stepper (Karl S uss XRS200), the proximity x-ray lithography is used for quick replica tion of high resolution patterns. The physical limits of the resolutio n are evaluated, taking into account both effects of near-field diffra ction and photoelectrons. All experimental ingredients are described, including the achievements in 50nm pattern replication and also in 20n m linewidth mask fabrication. Data are compared to the theoretical pre dictions, showing a reasonable agreement under close proximity conditi ons.