PREDICTING OUT-OF-PLANE DISTORTIONS DURING X-RAY MASK FABRICATION

Authors
LAIRD D ENGELSTAD R
Citation
D. Laird et R. Engelstad, PREDICTING OUT-OF-PLANE DISTORTIONS DURING X-RAY MASK FABRICATION, Microelectronic engineering, 30(1-4), 1996, pp. 223-226
Citations number
4
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
223 - 226
Database
ISI
SICI code
0167-9317(1996)30:1-4<223:PODDXM>2.0.ZU;2-3
Abstract
Sub-0.25 mu m technology may require gap settings as small as 10 mu m Consequently, it is of the utmost importance to fabricate masks which do not have large curvature towards the device wafer. In this work, fi nite element methods are used to predict the out-of-plane shape of the mask blank throughout the fabrication process in order to predict and correct bow (out-of-plane distortion) of mask blanks.