FREE-VOLUME EFFECTS IN CHEMICALLY AMPLIFIED DUV POSITIVE RESISTS

Authors
PAIN L LECORNEC C ROSILIO C PANIEZ PJ
Citation
L. Pain et al., FREE-VOLUME EFFECTS IN CHEMICALLY AMPLIFIED DUV POSITIVE RESISTS, Microelectronic engineering, 30(1-4), 1996, pp. 271-274
Citations number
7
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
271 - 274
Database
ISI
SICI code
0167-9317(1996)30:1-4<271:FEICAD>2.0.ZU;2-4
Abstract
Free volume greatly influences the lithographic performance of chemica lly amplified systems. This work studies its generation and variations during the various steps of the lithographic process, i.e. from film formation the post-exposure bake.