BOTTOM ANTIREFLECTIVE COATINGS - CONTROL OF THERMAL-PROCESSING

Authors
SCHILTZ A TERPAN JF BRUN S PANIEZ PJ
Citation
A. Schiltz et al., BOTTOM ANTIREFLECTIVE COATINGS - CONTROL OF THERMAL-PROCESSING, Microelectronic engineering, 30(1-4), 1996, pp. 283-286
Citations number
7
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
283 - 286
Database
ISI
SICI code
0167-9317(1996)30:1-4<283:BAC-CO>2.0.ZU;2-P
Abstract
This paper investigates the thermal process conditions of the Bottom A nti-Reflective Layer for i-Line lithography (BARLi) using various char acterization techniques such as TGA and WCM (Tg). The thermal modifica tions of the material are related to the variations in its functional properties, namely degree of solubility, absorption, thickness and ref lectivity. A thermal process window is defined to obtain a maximum imp rovement from this technology.