A NOVEL TECHNIQUE FOR THE FABRICATION OF SUB-20NM METALLIC WIRES

Citation
Acf. Hoole et An. Broers, A NOVEL TECHNIQUE FOR THE FABRICATION OF SUB-20NM METALLIC WIRES, Microelectronic engineering, 30(1-4), 1996, pp. 467-470
Citations number
7
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
467 - 470
Database
ISI
SICI code
0167-9317(1996)30:1-4<467:ANTFTF>2.0.ZU;2-6
Abstract
Continuos metallic wires similar to 10nm in width have been fabricated . These have been achieved using a new technique which exploits the ab ility to form ultra fine trenches in the surface of a SiO2 layer using the irradiated SiO2 process. The complete process is described along with simulations of the process which enable the process to be optimis ed.