FOCUSED ION-BEAM PROCESSING FOR MICROSCALE FABRICATION

Authors
WALKER JF MOORE DF WHITNEY JT
Citation
Jf. Walker et al., FOCUSED ION-BEAM PROCESSING FOR MICROSCALE FABRICATION, Microelectronic engineering, 30(1-4), 1996, pp. 517-522
Citations number
23
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
517 - 522
Database
ISI
SICI code
0167-9317(1996)30:1-4<517:FIPFMF>2.0.ZU;2-4
Abstract
Recent advances in focused ion beam (FIB) technology, towards finer fo cus and higher current density, have made micromachining by FIB both a n attractive ideal and a commercial reality. We demonstrate new applic ations in micro-electro-mechanical systems (MEMS) and sensors, high-re solution trimming of YBaCuO superconducting devices, and transmission electron microscopy (TEM) sample preparation which rely on the precisi on milling and high resolution imaging available from FIB.