INDIRECT TIP FABRICATION FOR SCANNING PROBE MICROSCOPY

Citation
A. Boisen et al., INDIRECT TIP FABRICATION FOR SCANNING PROBE MICROSCOPY, Microelectronic engineering, 30(1-4), 1996, pp. 579-582
Citations number
6
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
579 - 582
Database
ISI
SICI code
0167-9317(1996)30:1-4<579:ITFFSP>2.0.ZU;2-X
Abstract
Different fabrication technologies for Scanning Probe Microscopy tips have been investigated, using the so called mould technique. By a comb ination of reactive ion etching and wet anisotropic etching novel, hig h aspect ratio tip moulds have been produced in silicon. The resulting tip shapes are investigated by electroplating a nickel layer on the s ilicon substrate, whereafter the silicon is removed, yielding conducti ve tips, which can be used for Atomic Force Microscopy as well as Scan ning Tunnelling Microscopy.