Different fabrication technologies for Scanning Probe Microscopy tips
have been investigated, using the so called mould technique. By a comb
ination of reactive ion etching and wet anisotropic etching novel, hig
h aspect ratio tip moulds have been produced in silicon. The resulting
tip shapes are investigated by electroplating a nickel layer on the s
ilicon substrate, whereafter the silicon is removed, yielding conducti
ve tips, which can be used for Atomic Force Microscopy as well as Scan
ning Tunnelling Microscopy.