INVESTIGATIONS INTO THE SPECTRAL BEHAVIOR OF WAFERS AND THE CD-MEASUREMENT

Authors
HILD R NITZSCHE G MUSCHALL R ALTENBURGER U WIENECKE J
Citation
R. Hild et al., INVESTIGATIONS INTO THE SPECTRAL BEHAVIOR OF WAFERS AND THE CD-MEASUREMENT, Microelectronic engineering, 30(1-4), 1996, pp. 583-585
Citations number
4
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
30
Issue
1-4
Year of publication
1996
Pages
583 - 585
Database
ISI
SICI code
0167-9317(1996)30:1-4<583:IITSBO>2.0.ZU;2-#
Abstract
Three-dimensional transparent wafer structures can be modelled best us ing BPM. Then the image intensities are calculated for three wavelengt hs to discuss the colour properties in the image. Additionally the inf luence of sampling is analysed for CD- and overlay measurement by the help of simulated test wafer structures.