I. Chung et al., MODIFICATION OF PZT NUCLEATION AND GROWTH USING OXIDE LAYER IN MULTILAYERED ELECTRODES, Integrated ferroelectrics, 10(1-4), 1995, pp. 99-111
The ferroelectric properties of PZT on RuO2 electrodes were compared t
o those on RuO2/Pt electrodes. The better hysteretic properties were o
btained from Pt/RuO2/PZT/RuO2/Pt ferroelectric capacitors. The enhance
ment of ferroelectric properties is likely attributed to the modificat
ion in the microstructure of PZT film. The interfacial modification wo
uld be affected by the factors such as surface roughness, stress, and
porosity of RuO2 film. As the result of the interfacial modification,
better quality PZT films are produced, thereby resulting in better fer
roelectric properties. We made an effort to understand the relationshi
p between the grain size and the coercive voltage in terms of the doma
in formation and the domain pinning in connection with defects like gr
ain boundaries.