CAPACITIVE EFFECTS ON QUANTITATIVE DOPANT PROFILING WITH SCANNED ELECTROSTATIC FORCE MICROSCOPES

Citation
T. Hochwitz et al., CAPACITIVE EFFECTS ON QUANTITATIVE DOPANT PROFILING WITH SCANNED ELECTROSTATIC FORCE MICROSCOPES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 457-462
Citations number
23
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
14
Issue
1
Year of publication
1996
Pages
457 - 462
Database
ISI
SICI code
1071-1023(1996)14:1<457:CEOQDP>2.0.ZU;2-5
Abstract
A force-based scanning Kelvin probe microscope has been applied to the problem of dopant profiling in silicon. Initial data analysis assumed the detected electrostatic force couples the sample and only the tip at the end of a force sensing cantilever. Attempts to compare measurem ents quantitatively against device structures with this simple model f ailed. A significant contribution arises from the electrostatic force between the sample and the entire cantilever, which depends strongly u pon the relative size of the tip, cantilever, and lateral inhomogeneit ies in the surface topography and material composition of the sample. Actual and simulated measurements which demonstrate the characteristic signature of this effect are presented. (C) 1996 American Vacuum Soci ety.