T. Hochwitz et al., CAPACITIVE EFFECTS ON QUANTITATIVE DOPANT PROFILING WITH SCANNED ELECTROSTATIC FORCE MICROSCOPES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 457-462
A force-based scanning Kelvin probe microscope has been applied to the
problem of dopant profiling in silicon. Initial data analysis assumed
the detected electrostatic force couples the sample and only the tip
at the end of a force sensing cantilever. Attempts to compare measurem
ents quantitatively against device structures with this simple model f
ailed. A significant contribution arises from the electrostatic force
between the sample and the entire cantilever, which depends strongly u
pon the relative size of the tip, cantilever, and lateral inhomogeneit
ies in the surface topography and material composition of the sample.
Actual and simulated measurements which demonstrate the characteristic
signature of this effect are presented. (C) 1996 American Vacuum Soci
ety.