A microwave plasma stream source with variable ion energy operated und
er low magnetic field electron cyclotron resonance conditions has been
developed. A two mode resonant cavity (TE(111), E(010)) was used. It
was established that overdense plasma creation (TE(111)) and high ener
gy in-phase space localized electron plasma oscillations (E(010)) in a
decreased magnetic field lead to the potential for ion energy variati
on from 10 to 300 eV (up to 1 A of ion current, and a plasma cross sec
tion of 75 cm(2), hydrogen) by varying the TE(111), E(010) power, the
value of the magnetic field, and pressure. The threshold level of E(01
0)-mode power was also determined. An application of this CERA-V sourc
e to hydrogenation of semiconductor devices without deterioration of s
urface layers by ions and fast atoms is under investigation. (C) 1996
American Vacuum Society.