Ca3Ga2Ge4O14 thin films were prepared for the first time by rf sputter
ing. X-ray diffraction studies showed that the as-deposited films were
amorphous; crystallization began at 750 degrees C; annealing at 800 d
egrees C yielded polycrystalline trigonal Ca-gallogermanate. We studie
d changes in the optical properties of Ca3Ga2Ge4O14 films during struc
tural transformations. Our results demonstrate that rf sputtering can
be successfully used to prepare thin films of Ca-gallogermanates.