A novel method is reported for growing large single crystals of diamon
d at high pressure and high temperature using a metallic solvent, by w
hich high-quality crystals can be grown with a larger net growth rate.
The growing space has a recess at its lower temperature side, and the
seed crystal is located at the bottom of the recess. The seed grows t
o fill the recess, and its extended top surface serves as a large seed
for the second-stage growth. The main part of the crystals grown in t
he second stage is found to have no or only few metallic inclusions wh
en the size of the recess is selected appropriately. Experimental resu
lts show that the growth rate is small for the first-stage growth with
in the recess, but it becomes larger after the crystal grows out of th
e recess. The diffusion field of carbon in the solvent is simulated by
numerical calculation, and the results can reasonably explain this na
ture of the growth process.