S. Metzger et Be. Fischer, LOCATING RADIATION-SENSITIVE ZONES OF INTEGRATED-CIRCUITS USING AN ION-MICROPROBE, Microelectronic engineering, 31(1-4), 1996, pp. 41-46
An imaging technique is described which produces micron-resolution map
s of the single-event upset sensitive regions of integrated circuits d
uring ion-irradiation. From these ''upset images'' the identity and si
ze of a circuit's upset-prone components can be directly determined. U
tilizing a scanning ion-microprobe, the imaging technique selectively
exposes the functional units of an integrated circuit (e.g. transistor
drains, gates) and immediately measures the effect of high-energy ion
strikes on circuit performance. Such detailed spatial characterizatio
n provides a precision diagnostic technique with which the study of si
ngle-event upset processes in integrated circuits becomes more efficie
nt.