The performance of a laser-probing system due to analyzing signals in
MOSFETs is studied. A heterodyne laser interferometer is used for the
detection of changes in the free carrier concentrations induced by ter
minal biases in n-channel and p-channel MOSFETs. Measurements of the p
hase shift and intensity changes are carried out in accumulation, inve
rsion and depletion and compared to the results of a rigorous numerica
l modeling of the wave propagation. In the depletion region, the effec
t of the standing wave resulting from the reflection from the gate is
observed in experiment. As the sensitivity of the phase shift measurem
ents is in the order of 10(-5) rad, doping profiles could be derived f
rom optical experiment. We found that a strong impact of the reflectio
n properties of the polysilicon gate on the intensity signal poses a r
estriction to the applicability of the intensity modulation measuremen
ts for the inversion and accumulation conditions.