ADVANCED MANUFACTURING OF SIMOX FOR LOW-POWER ELECTRONICS

Authors
Citation
M. Alles et W. Krull, ADVANCED MANUFACTURING OF SIMOX FOR LOW-POWER ELECTRONICS, Solid-state electronics, 39(4), 1996, pp. 499-504
Citations number
17
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
39
Issue
4
Year of publication
1996
Pages
499 - 504
Database
ISI
SICI code
0038-1101(1996)39:4<499:AMOSFL>2.0.ZU;2-O
Abstract
Silicon-on-insulator (SOI) has emerged as a key technology for low pow er electronics. The merits of SOI technology have been demonstrated, a nd are gaining acceptance in the semiconductor industry. In order for the SOI approach to be viable, several factors must converge, includin g the availability of SOI substrates in sufficient quantity, of accept able quality, and at a competitive price. This work describes developm ents in SIMOX manufacturing technology and summarizes progress in each of these areas.