MOLECULAR DESIGN FOR PHOTO AND ELECTRON-BEAM LITHOGRAPHY WITH THIN-FILMS OF COORDINATION-COMPOUNDS

The photochemistry of coordination complexes in the solid state has be en investigated with a view towards developing a new method for the ph otolithographic deposition of materials. Ultraviolet exposure of thin films of coordination complexes through an optical lithography mask re sults in the patterning of materials in the exposed regions. The devel opment of this method requires photochemically active complexes which efficiently eject ligands upon photolysis to produce the desired mater ial in a solid state thin film. A generic reaction for the production of metal films is [GRAPHICS] In this paper the photochemistry of thin films of inorganic complexes of Co, Cu, Ni, Pd, Pt and U is presented. These examples will be used to outline the approaches used to design suitable precursor molecules for film deposition. Mechanistic studies of the surface photochemical reactions along with evidence for submicr on resolution lithography of materials derived from these complexes wi ll be highlighted. The use of electron beams to induce similar chemist ry will also be discussed.