K. Vaccaro et al., CADMIUM-SULFIDE SURFACE STABILIZATION FOR INP-BASED OPTOELECTRONIC DEVICES, Journal of electronic materials, 25(4), 1996, pp. 603-609
Thin layers of chemical bath deposited cadmium sulfide were used to im
prove the surface and interface properties of InP and its latticed-mat
ched III-V compounds. X-ray photoelectron spectroscopy indicates chemi
cal reduction of surface oxides and the prevention of subsequent group
III or V oxide formation. Photoluminescence spectra, measured between
1.0 and 1.3 mu m, indicate a dramatic reduction in phosphorus vacanci
es following CdS treatment. Metal-insulator-semiconductor capacitors f
abricated on n-type InP substrates with CdS interlayers display near-i
deal quasi-static response and interface-state densities in the low 10
(11)/eVcm(2) range. Thin CdS layers were used to passivate the surface
of InAlAs/InGaAs high electron mobility transistors (HEMTs) and metal
-semiconductor-metal (MSM) photodetectors. After CdS treatment, Schott
ky diode barrier heights of 0.6 eV were regularly obtained. For HEMTs,
drain-to-gate current ratios of 8 x 10(4) were observed after CdS tre
atment. For a new backside illuminated MSM design, the dark current of
CdS-treated samples was reduced three orders of magnitude to below 1
nA.