CADMIUM-SULFIDE SURFACE STABILIZATION FOR INP-BASED OPTOELECTRONIC DEVICES

Citation
K. Vaccaro et al., CADMIUM-SULFIDE SURFACE STABILIZATION FOR INP-BASED OPTOELECTRONIC DEVICES, Journal of electronic materials, 25(4), 1996, pp. 603-609
Citations number
19
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
25
Issue
4
Year of publication
1996
Pages
603 - 609
Database
ISI
SICI code
0361-5235(1996)25:4<603:CSSFIO>2.0.ZU;2-B
Abstract
Thin layers of chemical bath deposited cadmium sulfide were used to im prove the surface and interface properties of InP and its latticed-mat ched III-V compounds. X-ray photoelectron spectroscopy indicates chemi cal reduction of surface oxides and the prevention of subsequent group III or V oxide formation. Photoluminescence spectra, measured between 1.0 and 1.3 mu m, indicate a dramatic reduction in phosphorus vacanci es following CdS treatment. Metal-insulator-semiconductor capacitors f abricated on n-type InP substrates with CdS interlayers display near-i deal quasi-static response and interface-state densities in the low 10 (11)/eVcm(2) range. Thin CdS layers were used to passivate the surface of InAlAs/InGaAs high electron mobility transistors (HEMTs) and metal -semiconductor-metal (MSM) photodetectors. After CdS treatment, Schott ky diode barrier heights of 0.6 eV were regularly obtained. For HEMTs, drain-to-gate current ratios of 8 x 10(4) were observed after CdS tre atment. For a new backside illuminated MSM design, the dark current of CdS-treated samples was reduced three orders of magnitude to below 1 nA.