WURTZITE ZNXCD1-XS LAYERS GROWN BY COMBINING MBE AND HOT-WALL BEAM EPITAXY

Citation
M. Hetterich et al., WURTZITE ZNXCD1-XS LAYERS GROWN BY COMBINING MBE AND HOT-WALL BEAM EPITAXY, Journal of crystal growth, 159(1-4), 1996, pp. 81-84
Citations number
5
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
159
Issue
1-4
Year of publication
1996
Pages
81 - 84
Database
ISI
SICI code
0022-0248(1996)159:1-4<81:WZLGBC>2.0.ZU;2-J
Abstract
ZnxCd1-xS alloy layers revealing the wurtzite modification have been s uccessfully grown by molecular beam epitaxy for the first time. The he xagonal crystal structure is achieved by using a wurtzite CdS buffer l ayer deposited by hot-wall beam epitaxy on a GaAs((1) over bar (1) ove r bar (1) over bar)B substrate. Characterization of the alloy films in cludes in situ RHEED investigations, X-ray diffraction and optical mea surements, TEM diffraction patterns and reflection spectra are used to confirm the ZnxCd1-xS alloys to be of the wurtzite type. Photolumines cence is dominated by localized exciton emission. For layers with high Zn content (x > 0.4), film quality decreases due to the increased mis match to the CdS buffer and the fact, that the stable bulk phase for Z n-rich alloys is cubic.