GROWTH OF P-TYPE ZNSE BY METALORGANIC VAPOR-PHASE EPITAXY USING ETHYLAZIDE AS A NEW NITROGEN-SOURCE

Citation
K. Inoue et al., GROWTH OF P-TYPE ZNSE BY METALORGANIC VAPOR-PHASE EPITAXY USING ETHYLAZIDE AS A NEW NITROGEN-SOURCE, Journal of crystal growth, 159(1-4), 1996, pp. 130-133
Citations number
7
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
159
Issue
1-4
Year of publication
1996
Pages
130 - 133
Database
ISI
SICI code
0022-0248(1996)159:1-4<130:GOPZBM>2.0.ZU;2-I
Abstract
The growth of nitrogen-doped ZnSe epilayers has been investigated by m etalorganic vapor phase epitaxy (MOVPE) using ethylazide as a novel do pant source in which no N-H bonds are involved. Nitrogen was successfu lly incorporated in the ZnSe epilayers, whereas hydrogen was also foun d in the epilayers, primarily in the form of N-H bonds. By thermally a nnealing the samples, we have found that N-H bonds can be dissociated, yielding p-type ZnSe layers with hole concentrations of mid-10(17) cm (-3).