SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASE EPITAXY-GROWN INAS ANDINGAAS OBSERVED BY ATOMIC-FORCE MICROSCOPY

Citation
Cc. Hsu et al., SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASE EPITAXY-GROWN INAS ANDINGAAS OBSERVED BY ATOMIC-FORCE MICROSCOPY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 1105-1108
Citations number
15
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
14
Issue
2
Year of publication
1996
Pages
1105 - 1108
Database
ISI
SICI code
1071-1023(1996)14:2<1105:SOMVEI>2.0.ZU;2-3
Abstract
We have studied the surface morphology of metalorganic vapor phase epi taxy grown InAs and InGaAs by atomic force microscopy. InAs monolayer steps were observed on an annealed InAs substrate. Monolayer steps and terraces were also observed on I:he grown InAs homoepitaxial layers. Step edges are smooth and straight on the grown samples. The: growth m ode is by step flow. In the case of InGaAs lattice matched to an InP s ubstrate, steps are not as straight as those of InAs layers. This is d ue to a higher surface concentration gradient near step edges. Two-dim ensional islands were observed on the monolayer terraces at a high gro wth rate of 1.2 nm/s. (C) 1996 American Vacuum Society.