The electronic properties of boron in bulk 6H-SiC have been studied by
temperature dependent Hall effect, thermal admittance spectroscopy, a
nd optical absorption. A single acceptor level located between 0.27 an
d 0.35 eV above the valence band is associated with boron on a silicon
lattice site. The deep nature of this acceptor level prevents complet
e thermal activation of the level at room temperature and thus carrier
concentration measurements at this temperature will not give the tota
l boron concentration. A spread in the measured activation energy for
boron is reported. Measurement of optical absorption is suggested as a
nondestructive measure of boron concentration. No evidence for the D-
center was observed in this material.