METAL-INSULATOR-TRANSITION IN SB-DOPED SHORT-PERIOD SI SIGE SUPERLATTICES/

Citation
G. Stoger et al., METAL-INSULATOR-TRANSITION IN SB-DOPED SHORT-PERIOD SI SIGE SUPERLATTICES/, Solid-state electronics, 40(1-8), 1996, pp. 47-51
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
40
Issue
1-8
Year of publication
1996
Pages
47 - 51
Database
ISI
SICI code
0038-1101(1996)40:1-8<47:MISSSS>2.0.ZU;2-F
Abstract
Low-temperature magnetotransport measurements (50 mK < T < 4.2 K) on S b-doped short period Si/SiGe superlattices (d approximate to 40 Angstr om) are presented. The experiments show evidence for single particle q uantum interference and enhanced electron-electron interaction effects . Furthermore, for a Sb doping concentration of 4.5 x 10(18) cm(-3), a field induced metal to insulator transition (MIT) is observed for mag netic fields B parallel to the superlattice layers, whereas for the pe rpendicular direction of B, the MIT does not take place. The anisotrop y and dimensionality of the SL-samples is discussed.