1D X-RAY SPECKLE PATTERNS - A NOVEL PROBE OF INTERFACIAL DISORDER IN SEMICONDUCTOR SUPERLATTICES

Citation
Dl. Abernathy et al., 1D X-RAY SPECKLE PATTERNS - A NOVEL PROBE OF INTERFACIAL DISORDER IN SEMICONDUCTOR SUPERLATTICES, Solid-state electronics, 40(1-8), 1996, pp. 531-535
Citations number
16
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
40
Issue
1-8
Year of publication
1996
Pages
531 - 535
Database
ISI
SICI code
0038-1101(1996)40:1-8<531:1XSP-A>2.0.ZU;2-9
Abstract
The high brilliance of third generation undulator sources offers an un precedented opportunity to perform coherent X-ray diffraction studies of the structure and dynamics of materials on length scales down to in teratomic spacings. We have measured the coherent diffraction or ''spe ckle'' pattern from a GaAs/AlAs superlattice. The speckle diffraction is consistent with height fluctuations of the superlattice of similar to 10 Angstrom over lengths of order 60 mu m. Unlike other methods of characterizing the roughness of semiconductor material, such as scanni ng probe microscopies (STM, AFM) or scanning electron microscopy (SEM) , this novel coherent diffraction method is sensitive to lateral varia tions of the interface height buried within the small illuminated volu me of the material, and thus can offer information unavailable from ot her non-destructive techniques.