PYRAMIDAL QUANTUM-DOT STRUCTURES BY SELF-LIMITED SELECTIVE-AREA METALORGANIC VAPOR-PHASE EPITAXY

Citation
T. Fukui et al., PYRAMIDAL QUANTUM-DOT STRUCTURES BY SELF-LIMITED SELECTIVE-AREA METALORGANIC VAPOR-PHASE EPITAXY, Solid-state electronics, 40(1-8), 1996, pp. 799-802
Citations number
6
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
40
Issue
1-8
Year of publication
1996
Pages
799 - 802
Database
ISI
SICI code
0038-1101(1996)40:1-8<799:PQSBSS>2.0.ZU;2-B
Abstract
We have fabricated AlGaAs/GaAs quantum dot structures using selective area metalorganic vapor phase epitaxy (MOVPE). First, GaAs pyramidal s tructures with four-fold symmetric {011} facet side walls are formed o n SINx masked (001) GaAs with square openings. After the pyramidal str uctures were completely formed, no growth occurs on the top or side wa lls of the pyramids. Furthermore, the shape and width of the top area observed by a scanning electron microscope (SEM) and an atomic force m icroscope (AFM) is shown to be highly uniform. This indicates that sel f-limited growth occurs. Next, using these uniform pyramids, GaAs quan tum dots are overgrown on top of the pyramids using different growth c onditions. Sharp photoluminescence (PL) spectra are observed from unif orm quantum dots.