Aa. Talin et al., ELECTRON FIELD-EMISSION FROM AMORPHOUS TETRAHEDRALLY BONDED CARBON-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1719-1722
Citations number
21
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Electron field emission from two amorphous, tetrahedrally bonded diamo
ndlike carbon films, one with (a-tC:N), and a second without nitrogen
doping (a-tC), prepared by pulsed laser deposition has been investigat
ed using a scanning probe apparatus with micrometer spatial resolution
. Electric fields of 100 V/mu m (180 V/mu m) were required to initiate
emission from our a-tC:N (a-tC) films; however, once emission was est
ablished at a particular location, electrons could be drawn at average
fields as low as 10 V/mu m (60 V/mu m) from the same region. The init
iation of emission was concomitant with electrical discharges which we
re observed by video techniques. These discharges left craters with mi
crometer dimensions on the surfaces of otherwise smooth films. (C) 199
6 American Vacuum Society.