MECHANISMS AFFECTING KINETIC ENERGIES OF LASER-ABLATED MATERIALS

Authors
CHEN KR LEBOEUF JN WOOD RF GEOHEGAN DB DONATO JM LIU CL PURETZKY AA
Citation
Kr. Chen et al., MECHANISMS AFFECTING KINETIC ENERGIES OF LASER-ABLATED MATERIALS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1111-1114
Citations number
11
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
14
Issue
3
Year of publication
1996
Part
1
Pages
1111 - 1114
Database
ISI
SICI code
0734-2101(1996)14:3<1111:MAKEOL>2.0.ZU;2-I
Abstract
A dynamic source effect was found to accelerate the plume expansion ve locity much higher than that from a conventional free-expansion model. A self-similar theory and a hydrodynamic model are developed to study this effect, which may help to explain experimentally observed high f ront expansion velocity. Background gas can also affect the kinetic en ergies. High background gas may cause the ablated materials to go back ward. Experimentally observed plume splitting is also discussed. (C) 1 996 American Vacuum Society.