T. Paskova et al., ANTIMONY DOPED GAAS - ROLE OF THE ISOELECTRONIC DOPANT IN DEFECT EVOLUTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1729-1735
Metalorganic vapor phase epitaxial GaAs:Sb layers and Schottky barrier
structures based on them have been investigated regarding defect evol
ution versus doping level. Three types of defects are considered such
as surface morphology imperfections, structural defects in the epilaye
rs, and interface defects at the Schottky barriers. A correlation betw
een the defect behavior in the layers and the Schottky structures has
been observed. It has been shown that an optimal Sb doping region exis
ts where the defect density decreases compared with the undoped and hi
ghly Sb doped samples. The dominating defects in the Schottky barrier
interface are dislocation-related states which can be effectively infl
uenced by the isoelectronic doping. (C) 1996 American Vacuum Society.