W. Zhu et al., ELECTRON FIELD-EMISSION FROM CHEMICAL-VAPOR-DEPOSITED DIAMOND, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 2011-2019
Diamond films and islands have been synthesized with varying defect de
nsities and dopant levels by chemical vapor deposition for field emiss
ion display applications. Vacuum field emission measurements show that
the electric held required to induce electron emission from diamond c
an be significantly reduced when the samples are properly grown or pos
tgrowth processed so that they contain a substantial amount of structu
ral defects. The defective diamond is characterized by a broadened pea
k at 1332 cm(-1) in Raman spectroscopy with a full width at half-maxim
um in the range of 7-11 cm(-1). These materials require a turn-on fiel
d (for a current density of 0.01 mA/cm(2)) as low as 15 V/mu m, and a
threshold held (for a current density of 10 mA/cm(2)) as low as 30 V/m
u m for electron emission. These field values are almost an order of m
agnitude lower than those required for high quality, p-type semiconduc
ting diamond. Detailed numerical analysis of the emission current-volt
age data from multiple diamond tips with varying geometric and electro
nic properties is presented, and the mechanisms responsible for such l
ow voltage electron emission from defective diamond are discussed. (C)
1996 American Vacuum Society.