M. Ghioni et al., A VLSI-COMPATIBLE HIGH-SPEED SILICON PHOTODETECTOR FOR OPTICAL-DATA LINK APPLICATIONS, I.E.E.E. transactions on electron devices, 43(7), 1996, pp. 1054-1060
A novel silicon photodetector suitable for high-speed, low-voltage ope
ration at 780- to 850-nm wavelengths is reported. It consists of an in
terdigitated p-i-n detector fabricated on a silicon-on-insulator (SOI)
substrate by using a standard bipolar process. Biased at 3.5 V, this
device attains a -3-dB bandwidth in excess of 1 GHz at lambda = 840 nm
. The de responsivity measured at lambda = 840 nm on nonoptimized stru
ctures ranges from 0.05 to 0.09 A/W, depending on the finger shadowing
factor. A new approach for improving the responsivity is here propose
d and quantitatively analyzed. The fabricated devices exhibit extremel
y Low dark currents, small capacitance, large dynamic range, and no ev
idence of low-frequency gain. The overall performance and process comp
atibility of these photodetectors make them viable candidates for the
fabrication of silicon monolithic receivers for fiber-optic data links
.