THE FABRICATION OF NICKEL AND CHROMIUM SILICIDE USING AN XECL EXCIMER-LASER

Authors
BARBERO CJ DENG C SIGMON TW RUSSELL SW ALFORD TL
Citation
Cj. Barbero et al., THE FABRICATION OF NICKEL AND CHROMIUM SILICIDE USING AN XECL EXCIMER-LASER, Journal of crystal growth, 165(1-2), 1996, pp. 57-60
Citations number
15
Categorie Soggetti
Crystallography
Journal title
Journal of crystal growth → ACNP
ISSN journal
00220248
Volume
165
Issue
1-2
Year of publication
1996
Pages
57 - 60
Database
ISI
SICI code
0022-0248(1996)165:1-2<57:TFONAC>2.0.ZU;2-5
Abstract
The formation of nickel and chromium silicides using an XeCl excimer l aser has been studied. Both metals are deposited to a thickness of 500 Angstrom by electron beam evaporation on silicon substrates. These la yers are then processed using laser fluences ranging from 0.45 to 1.4 J/cm(2), and a variable number of pulses. Rutherford backscattering sp ectrometry (RES) and cross-sectional transmission electron microscopy (XTEM) indicate the formation of crystalline NiSi2 and CrSi2 at the Ni /Si and Cr/Si interfaces, respectively.