Various methods for the growth of GaSb single crystals have been tried
. It has been found that the oxidation of the GaSb surface and the low
vapor pressure of GaSb material are main problems. For this reason th
e Czochralski method without encapsulant in a flow of very pure hydrog
en seems to be the most suitable technique. Other tested methods have
not been acceptable for several reasons (the economic point of view, q
uality of the crystals, highly complicated equipment, etc.). The Czoch
ralski technique with the use of hydrogen reduces the formation of the
oxide layer and makes it possible to grow fully single crystalline, h
igh-quality GaSb with low dislocation density(< 10(2) cm(-2)).