STATISTICAL SIMULATION OF IC TECHNOLOGY - A BIPOLAR PROCESS EXAMPLE

Citation
Tj. Sanders et al., STATISTICAL SIMULATION OF IC TECHNOLOGY - A BIPOLAR PROCESS EXAMPLE, Microelectronics and reliability, 36(9), 1996, pp. 1191-1205
Citations number
10
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
00262714
Volume
36
Issue
9
Year of publication
1996
Pages
1191 - 1205
Database
ISI
SICI code
0026-2714(1996)36:9<1191:SSOIT->2.0.ZU;2-7
Abstract
Statistical simulation using design of experiments has been employed f or integrated circuit technology development. A software program calle d STADIUM was developed to implement this statistical methodology. The software has been designed to be user friendly and to guide the engin eer who is not a statistics expert through the process of deriving a v alid statistical answer. Inputs to the STADIUM system include integrat ed circuit fabrication variations and when coupled with semiconductor process and device simulators can estimate the expected variations of device parameters such as transistor gain and threshold voltage. This paper presents the detailed procedure and results of a statistical sim ulation of a bipolar transistor technology. Copyright (C) 1996 Elsevie r Science Ltd