J. Li et Jw. Mcconkey, VACUUM-ULTRAVIOLET EMISSION FROM RADIO-FREQUENCY PLASMAS OF SF6 AND CF4, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2102-2105
Citations number
26
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
The vacuum ultraviolet and ultraviolet emission (115 nm<lambda<300 nm)
from radio frequency (rf) discharges through CF4 and SF6 have been in
vestigated as a function of source pressure and rf power. Prominent fe
atures of the spectra arise from dissociative excitation of the parent
species. Other significant emissions are impurity bands from CO (CF4)
or SO (SF6) caused largely by oxygen release from the walls of the di
scharge tube and subsequent discharge chemistry and excitation. Minor
emissions from excited CF4+, CF3, and/or CF2 were obtained from CF4 di
scharges. (C) 1996 American Vacuum Society.