CHARACTERIZATION OF HELICON WAVE PLASMA DESIGNED FOR DIRECT-CURRENT SPUTTERING

The rf plasma produced in a helicon wave frequency range was studied u sing helical antennas and its application to de sputtering at low Ar p ressures was reported. A dense plasma of the order of 10(12)-10(13) cm (-3) could be obtained at a pressure around 0.1 Pa by using the antenn as with azimuthal mode number of m=+/-1 or m=0. The measurement of the axial magnetic component B-z of the rf held in the plasma showed evid ence of the excitation of helicon wave. A sputtering apparatus has bee n developed by means of the helicon wave plasma excited with a m=0 mod e two-turn antenna. It was found that the characteristics of the rf pl asma enhanced sputtering discharge were dominated by the properties of the rf plasma sustained at pressures as low as 3x10(-2) Pa. A target current as high as 2 A at a pressure of 0.4 Pa was achieved, and sputt ering of the Al target indicated that a deposition rate of 1 mu m/min could be obtained under this condition. (C) 1996 American Vacuum Socie ty.