CLEANING THIN-FILM DIAMOND SURFACES FOR DEVICE FABRICATION - AN AUGER-ELECTRON SPECTROSCOPIC STUDY

Auger electron spectroscopy was used to analyze polycrystalline thin-f ilm diamond surfaces following the use of differing methods for the re moval of unwanted nondiamond carbon. Exposing the film to a hydrogen p lasma at the termination of the growth process is effective for produc ing a surface that gives an Auger spectrum typical of diamond with lit tle contamination. Strongly oxidizing solutions involving sulfuric aci d generate low concentrations of surface sulfur together with an oxide phase. However, in the case of an ammonium persulfate-sulfuric acid e tchant solution, the Auger features associated with the diamond more c losely resemble those of single crystal material suggesting that this treatment may offer better performance when used during the fabricatio n of thin-film diamond electronic devices. (C) 1996 American Vacuum So ciety.