ATOMIC-FORCE MICROSCOPY OF AMORPHOUS HYDROGENATED CARBON-NITROGEN FILMS DEPOSITED BY RADIO-FREQUENCY-PLASMA DECOMPOSITION OF METHANE-AMMONIA GAS-MIXTURES

Atomic force microscopy was used for the surface characterization of h ard amorphous hydrogenated carbon-nitrogen films deposited by plasma e nhanced chemical vapor deposition. The films were deposited onto silic on substrates by rf-plasma decomposition of methane-ammonia mixtures. The film roughness and the friction coefficient between the silicon ni tride tip and the film surface were determined. The results indicate t hat the surface roughness increases with the amount of nitrogen incorp orated in the film. The friction coefficients, measured in air, are al most constant for nitrogen incorporation up to 11 at. %. (C) 1996 Amer ican Vacuum Society.