COMPACT ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE FOR MOLECULAR-BEAMEPITAXY APPLICATIONS

Authors
ROSSNER U BRUNLECUNFF D BARSKI A DAUDIN B
Citation
U. Rossner et al., COMPACT ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE FOR MOLECULAR-BEAMEPITAXY APPLICATIONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2655-2658
Citations number
16
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
14
Issue
4
Year of publication
1996
Pages
2655 - 2658
Database
ISI
SICI code
0734-2101(1996)14:4<2655:CEPSFM>2.0.ZU;2-M
Abstract
We describe a compact, versatile electron cyclotron resonance (ECR) ni trogen plasma source specially designed to be mounted on a 35 conflat flange. The operation frequency is 2.45 GHz. The magnetic field is pro duced by permanent magnets. In order to eliminate ions in the plasma s tream, a nonaxial geometry of the magnetic field was chosen. Two appli cations are discussed, namely, the p-type doping of II-VI tellurides a nd the growth of III-V nitrides. In both cases, use of the ECR plasma source results in high quality material. (C) 1996 American Vacuum Soci ety.