Zh. Yu et al., PHOTON-ASSISTED GROWTH OF NITROGEN-DOPED CDTE AND THE EFFECTS OF HYDROGEN INCORPORATION DURING GROWTH, Journal of electronic materials, 25(8), 1996, pp. 1247-1253
Nitrogen doping in CdTe epilayers grown by photo-assisted molecular be
am epitaxy was demonstrated using an rf plasma source. The effect of t
he presence of atomic hydrogen during growth of undoped and nitrogen-d
oped CdTe was investigated. The layers were characterized using photol
uminescence spectroscopy (PL), Hall effect, secondary ion mass spectro
scopy (SIMS), Fourier transform infrared spectroscopy, and atomic forc
e microscopy. PL confirmed the incorporation of nitrogen as: accepters
. While p-type carrier concentrations greater than 10(18) cm(-3) were
easily obtained, SIMS measurements indicated that nitrogen was concent
rated near the undoped-doped and epilayer-substrate interfaces which c
omplicates interpretation of activation efficiency. Hydrogen incorpora
tion was found to be enhanced by the presence of nitrogen. Infrared ab
sorption measurements strongly suggested the formation of N-H complexe
s. Hall measurements indicated that complexes are formed which are don
or-like in nature. The presence of atomic hydrogen during growth radic
ally changed the low temperature photoluminescence in both undoped and
nitrogen-doped layers. Exciton-related luminescence was quenched at l
ow temperature. Nitrogen-related donor-acceptor pair luminescence was
also absent from the N-doped hydrogenated layers, consistent with comp
lex formation. Copper (a cation-site acceptor) donor-acceptor pair lum
inescence appeared to be enhanced by hydrogenation.