INTERFACE FORMATION BETWEEN DEPOSITED SN AND HG0.8CD0.2TE

Citation
H. Zimmermann et al., INTERFACE FORMATION BETWEEN DEPOSITED SN AND HG0.8CD0.2TE, Journal of electronic materials, 25(8), 1996, pp. 1293-1299
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
25
Issue
8
Year of publication
1996
Pages
1293 - 1299
Database
ISI
SICI code
0361-5235(1996)25:8<1293:IFBDSA>2.0.ZU;2-G
Abstract
The structure of the interface formed by the reaction of deposited Sn on Hg0.78Cd0.22Te(111)B was investigated by hemispherically scanned x- ray photoelectron spectroscopy including x-ray photoelectron diffracti on (XPD). The interface formation was found to proceed as follows: At the onset of Sn deposition, Hg is expelled and substituted by Sn in th e topmost monolayer of the Hg0.78Gd0.22Te lattice while the zinc-blend e structure of the original surface is maintained. With further Sn dep osition (and further loss of Hg), an epitaxial layer of cubic SnTe (wi th inclusions of CdTe) was found to grow. At room temperature, the SnT e growth stopped after a few monolayers, and the epitaxial growth of c ubic alpha-Sn was observed to start on top of it. At elevated depositi on temperatures, the SnTe intermediate layer continued to grow up to s everal 100 Angstrom.