IN-SITU SENSORS FOR MONITORING AND CONTROL IN MOLECULAR-BEAM EPITAXIAL-GROWTH OF HG1-XCDXTE

Citation
Mj. Bevan et al., IN-SITU SENSORS FOR MONITORING AND CONTROL IN MOLECULAR-BEAM EPITAXIAL-GROWTH OF HG1-XCDXTE, Journal of electronic materials, 25(8), 1996, pp. 1371-1374
Citations number
7
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
25
Issue
8
Year of publication
1996
Pages
1371 - 1374
Database
ISI
SICI code
0361-5235(1996)25:8<1371:ISFMAC>2.0.ZU;2-2
Abstract
The current status of the implementation and refinement of two wafer s tate sensors for in situ monitoring and control during molecular beam epitaxial (MBE) growth of Hg1-xCdxTe will be reported. First a rapid s can spectral ellipsometer has been developed and employed for precisel y measuring compositions of Hg1-xCdxTe alloys during growth. MBE films in the composition range x = 0.20 to 0.30 have been grown and in situ spectra taken at the growth temperature (180 degrees C) and at room t emperature. The MBE films were treated as single layers without the ne ed to invoke any surface film (due to surface roughness, oxide, or of any different composition) as required for ex situ data. The least squ ares fit over the whole spectral range was used as a measure of the pr ecision. The film composition was also determined ex situ by wavelengt h dispersive analysis of x-rays and by Fourier transform infrared (FTI R) spectrometry after verifying that there was no lateral variation. A precision of better than +/-0.0015 has so far been demonstrated using in situ spectral ellipsometry for Cd composition or CdTe mole fractio n, x, measurements. This compares with +/-0.003 for single wavelength ellipsometry. The composition of Hg1-xCdxTe films were also monitored during growth. A spectral pyrometer based on a FTIR spectrometer has a lso been developed for substrate temperature measurements during growt h. The spectral pyrometer measures both the emission and reflectance t o give the emissivity of a growing sample over a range of wavelengths spanning the peak of the grey body emission. From the reflectivity mea surements, the thickness (in excess of 1 mu m) of the growing film is also determined from the interference fringes. The spectral ellipsomet er is only capable of measuring thicknesses up to ca. 5000 Angstrom(i. e. optically thin). Excellent agreement is obtained between the in sit u (at growth temperature) and ex situ (at room temperature) thickness measurements. The small discrepancy can be explained by the refractive index of Hg1-xCdxTe being 5% higher at the growth temperature than at room temperature. The combination of in situ sensors now provides a m eans of continuously monitoring the composition and thickness: of the growing Hg1-xCdxTe film.