COMPUTER-SIMULATIONS OF POROUS SILICON FORMATION

Citation
Ym. Weng et al., COMPUTER-SIMULATIONS OF POROUS SILICON FORMATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2505-2509
Citations number
17
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
14
Issue
4
Year of publication
1996
Pages
2505 - 2509
Database
ISI
SICI code
1071-1023(1996)14:4<2505:COPSF>2.0.ZU;2-U
Abstract
A computer simulation has been carried out to study the dynamics of po re formation in porous silicon. Porous structures were generated by a simple three-dimensional Monte Carlo calculation, based on a modified percolation model for pore growth in lightly and heavily doped silicon substrates. The results are consistent with recent observations. As a n approximate guide, the type formed morphology was shown to depend ma inly on the doping level of the substrate. A strong dependence of the average porosity on the doping level of the substrate is also predicte d. (C) 1996 American Vacuum Society.