Ym. Weng et al., COMPUTER-SIMULATIONS OF POROUS SILICON FORMATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2505-2509
A computer simulation has been carried out to study the dynamics of po
re formation in porous silicon. Porous structures were generated by a
simple three-dimensional Monte Carlo calculation, based on a modified
percolation model for pore growth in lightly and heavily doped silicon
substrates. The results are consistent with recent observations. As a
n approximate guide, the type formed morphology was shown to depend ma
inly on the doping level of the substrate. A strong dependence of the
average porosity on the doping level of the substrate is also predicte
d. (C) 1996 American Vacuum Society.