PATTERNED EUTECTIC BONDING WITH AL GE THIN-FILMS FOR MICROELECTROMECHANICAL SYSTEMS/

Authors
Citation
B. Vu et Pm. Zavracky, PATTERNED EUTECTIC BONDING WITH AL GE THIN-FILMS FOR MICROELECTROMECHANICAL SYSTEMS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2588-2594
Citations number
16
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
14
Issue
4
Year of publication
1996
Pages
2588 - 2594
Database
ISI
SICI code
1071-1023(1996)14:4<2588:PEBWAG>2.0.ZU;2-E
Abstract
In this article, we report our results using the aluminum/germanium eu tectic to create high quality patterned bonds between two silicon dice . The bonds are formed using thin metal layers and with essentially no pressure applied. We have measured bond strength by fabricating and b onding patterned dice. Pull tests were conducted and the force require d to separate the bonds was measured and found to be about 1.6x10(7) P a. When bonds break, portions of the substrate are removed. Testing of the hermiticity of the bond demonstrated that leak rates below the de tection limit of the leak tester (10(-9) sccs) are possible. (C) 1996 American Vacuum Society.