B. Vu et Pm. Zavracky, PATTERNED EUTECTIC BONDING WITH AL GE THIN-FILMS FOR MICROELECTROMECHANICAL SYSTEMS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2588-2594
In this article, we report our results using the aluminum/germanium eu
tectic to create high quality patterned bonds between two silicon dice
. The bonds are formed using thin metal layers and with essentially no
pressure applied. We have measured bond strength by fabricating and b
onding patterned dice. Pull tests were conducted and the force require
d to separate the bonds was measured and found to be about 1.6x10(7) P
a. When bonds break, portions of the substrate are removed. Testing of
the hermiticity of the bond demonstrated that leak rates below the de
tection limit of the leak tester (10(-9) sccs) are possible. (C) 1996
American Vacuum Society.