Dzy. Ting et Tc. Mcgill, INTERFACE ROUGHNESS EFFECTS ON TRANSPORT IN TUNNEL STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2790-2793
Direct simulations of interface roughness effects on transport propert
ies of tunnel structures are performed using the planar supercell stac
k method. The method allows for the inclusion of realistic three-dimen
sional rough interfacial geometries in transport calculations. For dou
ble barrier resonant tunneling structures, we used our method to analy
ze the effect of roughness at each of the four interfaces, and to test
for sensitivity of transport properties to island size and height. Ou
r simulations yields the following conclusions: (1) We find that scatt
ering of off-resonance states into on-resonance states provides the do
minant contribution to interface roughness assisted tunneling. Analyse
s of scattering strength sensitivity to interface layer configurations
reveals preferential scattering into Delta k parallel to approximate
to 2 pi/lambda states, where lambda is the island size. (2) We find th
at roughness at interfaces adjacent to the quantum well can cause late
ral localization of wave functions, which increases with island size a
nd depth. Lateral localization can result in the broadening and shifti
ng of transmission resonances, and the introduction of preferential tr
ansmission paths. In structures with wide and tall islands, it is poss
ible to find localization over ''islands'' as well as localization ove
r ''oceans.'' (3) The leading rough interface is the strongest off-res
onance scatterer, while rough interfaces adjacent to quantum well are
the strongest on-resonance scatterers. The trailing interface is the w
eakest scatterer. (C) 1996 American Vacuum Society.