RELAXATION OF THE STEP PROFILE FOR DIFFERENT MICROSCOPIC MECHANISMS

Citation
Dj. Liu et al., RELAXATION OF THE STEP PROFILE FOR DIFFERENT MICROSCOPIC MECHANISMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(4), 1996, pp. 2799-2808
Citations number
32
Categorie Soggetti
Physics, Applied
ISSN journal
10711023
Volume
14
Issue
4
Year of publication
1996
Pages
2799 - 2808
Database
ISI
SICI code
1071-1023(1996)14:4<2799:ROTSPF>2.0.ZU;2-W
Abstract
Theoretical and experimental studies of the rate of decay of metastabl e structures are compared quantitatively. The effect of decay mechanis m, size, and periodicity of the structure on the rate of decay is eval uated within both a coarse-grained step-based model and a continuum mo del. For high-amplitude structures, the decay scales with size (N) and time as (t/N-alpha)(-beta). The exponents alpha and beta depend on th e mass transport mechanism. The size scaling is alpha=4 for locally co nserved diffusive flux and alpha=2 for locally nonconserved flux. The time scaling exponent is beta=1/5 for diffusive limited mass transport and beta=1/4 for step attachment limited mass transport. Experiments were performed on metastable structures of controlled sizes 3-5 nm in height, prepared by direct current heating on Si(111). Quantitative ag reement with theoretical predictions of both scaling (alpha=4.3+/-0.5, beta=0.2+/-0.3) and absolute rate of decay were obtained. (C) 1996 Am erican Vacuum Society.